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In order to create sub micron vias between steel layers on silicon IC circuits, the tungsten filled via processes have been in a continuing state of growth over the past 15 years. Processing is advanced, costly, and troublesome to breed. The introduction of galvanic cells, by way of undercutting, and exposed plugs are just among the plagues which have hit a number of users of the technology. Mentioned in this paper is another approach to the complicated tungsten crammed via interconnect course of. The proposed course of yields well at sub micron geometries, is straightforward to carry out, and is inexpensive compared to the tungsten filled by way of process. Contact resistance improves tremendously over the standard tungsten process. The test run achieved a mean worth of zero.25 ohms per by … Read More